■It is a popular illustrator collaboration design mask. Contains the ingredient from antient time Rice Ferment Extract × CICA (Centella Asiatica). Beauty essence containing well balanced water and oil that thoroughly cares noticeable pores
and rough skin caused by dryness and sebum. It makes skin firmer, finer and smoother. Weak acidity, Artificial color free, Paraben free ( preservative), Ultraviolet absorber free, Silicon free.
■After washing face, apply the mask to face and remove after 10 to 15 minutes. Then gently massage the skin so that all the essence can be absorbed.
■WATER (AQUA), BUTYLENE GLYCOL, DIPROPYLENE GLYCOL, GLYCERIN, CENTELLA ASIATICA LEAF EXTRACT, HOUTTUYNIA CORDATA EXTRACT, ORYZA SATIVA (RICE) BRAN EXTRACT, RICE FERMENT FILTRATE (SAKE), ACRYLATES/C10-30 ALKYL ACRYLATE CROSSPOLYMER, CARBOMER, DISODIUM EDTA, ISOTRIDECYL ISONONANOATE, MALIC ACID, PEG-50 HYDROGENATED CASTOR OIL ISOSTEARATE, SODIUM HYDROXIDE, TRIETHYLHEXANOIN, PHENOXYETHANOL, FRAGRANCE (PARFUM)
"■ JAPAN
